By Lawrence Casper
content material: Analytical techniques and specialist platforms within the characterization of microelectronic units / D.E. Passoja, Lawrence A. Casper, and A.J. Scharman --
electric characterization of semiconductor fabrics and units / Dieter okay. Schroder --
Dopant profiles by means of the spreading resistance approach / Robert G. Mazur --
Scanning electron microscopic options for characterization of semiconductor fabrics / Rodney A. younger and Ronald V. Kalin --
Semiconductor fabrics illness diagnostics for submicrometer very huge scale integration expertise / G.A. Rozgonyi and D.K. Sadana --
purposes of secondary ion mass spectroscopy to characterization of microelectronic fabrics / Mary Ryan-Hotchkiss --
functions of Auger electron spectroscopy in microelectronics / Paul A. Lindfors, Ronald W. Kee, and Douglas L. Jones --
X-ray photoelectron spectroscopy utilized to microelectronic fabrics / William F. Stickle and Kenneth D. Bomben --
software of neutron intensity profiling to microelectronic fabrics processing / R.G. Downing, J.T. Maki, and R.F. Fleming --
Thermal-wave size of thin-film thickness / Allan Rosencwaig --
Characterization of fabrics, skinny movies, and interfaces through optical reflectance and ellipsometric ideas / D.E. Aspnes --
size of the oxygen and carbon content material of silicon wafers by means of Fourier rework IR spectrophotometry / Aslan Baghdadi --
program of the Raman microprobe to analytical difficulties of microelectronics / Fran Adar --
Characterization of gallium arsenide by means of magneto-optical photoluminescent spectroscopy / D.C. Reynolds --
Thermal-wave imaging in a scanning electron microscope / Allan Rosencwaig --
Fourier remodel mass spectrometry within the microelectronics carrier laboratory / W.H. Penzel --
fabrics characterization utilizing elemental and isotopic analyses by means of inductively coupled plasma mass spectrometry / B. Shushan, E.S.K. Quan, A. Boorn, D.J. Douglas, and G. Rosenblatt --
Activation research of electronics fabrics / Richard M. Lindstrom --
hint point survey analyses by way of spark resource mass spectrography / Fredric D. Leipziger and Richard J. Guidoboni --
Characterization of elements in plasma phosphorus-doped oxides / Jana Houskova, Kim-Khanh N. Ho, and Marjorie okay. Balazs --
method regulate of vacuum-deposited nickel-chromium for the fabrication of reproducible thin-film resistors / Vineet S. Dharmadhikari --
Characterization of spin-on glass movies as a planarizing dielectric / Satish okay. Gupta and Roland L. Chin --
results of assorted chemistries on silicon-wafer cleansing / D. Scott Becker, William R. Schmidt, Charlie A. Peterson, and Don C. Burkman --
tracking of debris in gases with a laser counter / C.E. Nowakowski and J.V. Martinez de Pinillos --
Microelectronics processing challenge fixing : the synergism of complementary options / J.N. Ramsey.
Read Online or Download Microelectronics Processing: Inorganic Materials Characterization PDF
Best chemistry books
It'd be superfluous to emphasize the significance of digital . spectroscopy in structural or analytic examine. It has now turn into a question of regimen to checklist the ultra-violet or noticeable spectra of compounds for reasons of id or constitution elucidation. The spectrophotonletric tools of study have changed the traditional tools in ever so rnany cases.
This ebook is the complaints of the Pan Africa Chemistry community Biodiversity convention which used to be held in September 2008. A key target of the RSC/Syngenta Pan Africa Chemistry community (PACN) is to attach African scientists via a cycle of meetings and workshops and this convention held on the collage of Nairobi used to be the 1st of those.
Content material: Lindman, B. and Wennerström, H. Micelles. Amphiphile aggression in aqueous answer. -- Eicke, H. -F. Surfactants in nonpolar solvents. Aggregation and micellization
- Environmental Toxicity Testing (Sheffield Analytical Chemistry Series)
- Chemistry and Radioastronomy
- Eco-Friendly Synthesis of Fine Chemicals
- Macromolecular chemistry Volume 2 A review of the literature published during 1979 and 1980
- Synthetic and Natural Phenols
Extra resources for Microelectronics Processing: Inorganic Materials Characterization
S. Personal Communication. 4. S. "Semiconductor Statistics"; Pergamon Press: New York, 1962; p. 122. 5. T. IEEE Trans. 1971, ED-18, 965-973. 6. R "MOS Physics and Technology"; Wiley: New York, 1982 7. ; Faktor 328. 8. G. This Volume. 9. F. "Semiconductor Processing"; ASTM: Philadelphia, 1984; pp. 409-425. 10. O. Appl. Phys. Lett. 1975, 27, 353-355. 11. M. Phys. Stat. , 1977, 39a, 11-39. 12. K. IEEE Trans. 1982, ED-29, 1336-1338. 13. R. "Semiconductor Measurements and Instrumentation"; McGraw-Hill: New York, 1975; pp.
This i sf u r t h e r aggravated i f , f o r e x a m p l e , t h e i o n - i m p l a n t e d l a y e r i s not w h o l l y a c t i v a t e d o r i f t h e r e i s a steep doping g r a d i e n t . I t i s i m p o r t a n t t h a t one i s a w a r e o f these d i f f i c u l t i e s . Various techniques are used f o r t h e s e measurements. The most p o p u l a r a r e c a p a c i t a n c e - v o l t a g e (C-V) p r o f i l i n g , s p r e a d i n g r e s i s t a n c e and secondary i o n mass s p e c t r o s c o p y ( S I M S ) .
T h i s d i s c u s s i o n of the m e c h a n i c a l and e l e c t r i c a l p r o p e r t i e s o f s p r e a d i n g r e s i s t a n c e c o n t a c t s makes i t c l e a r t h a t the probes used d i f f e r from any o t h e r s p r e v i o u s l y used i n e i t h e r p o i n t - c o n t a c t d i o d e work o r i n semiconductor e l e c t r i c a l measurements. System E l e c t r o n i c s . I n a d d i t i o n t o u s i n g s p e c i a l i z e d c o n t a c t s and mechanical apparatus, spreading r e s i s t a n c e p r o f i l i n g a l s o r e q u i r e s s p e c i a l i z e d e l e c t r o n i c s .