By John T. Milek
The great amount of literature at the expertise of skinny movie silicon nitride indi cates the curiosity of the dept of protection, NASA and the semiconductor within the improvement and whole usage of the fabric. This survey is anxious in simple terms with the skinny movie features and homes of silicon nitride as at present used by the semiconductor or microelectronics undefined. it's also a few of the equipment of training. functions in microelectronic units and circuits are to be supplied partly 2 of the survey. a few bulk silicon nitride estate facts is integrated for easy reference and comparability reasons. The survey particularly excludes references and knowledge no longer in the public area. ACKNOWLEDGEMENT This survey was once generated less than U.S. Air strength agreement F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air strength fabrics Laboratory, Wright-Patterson Air strength Base, Ohio appearing as venture Engineer. the writer wish to recognize the assis tance of Dr. Judd Q. Bartling, Litton platforms, Inc., information and keep watch over structures department, forest Hills, California and Dr. Thomas C. corridor, Hughes airplane corporation, Culver urban, California in reviewing the survey. v CONTENTS Preface. i creation 1 Literature evaluation. 1 Bulk features 1 know-how evaluation. 2 References four tools of instruction • five advent • five Direct Nitridation procedure eight Evaporation process • nine Glow Discharge technique. 10 Ion Beam process. thirteen Sputtering tools thirteen Pyrolytic equipment. 15 Silane and Ammonia response 15 Silicon Tetrachloride and Tetrafluoride response. 24 Silane and Hydrazine response 27 creation Operations. 28 Equipment.
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Extra resources for Silicon Nitride for Microelectronic Applications: Part 1 Preparation and Properties
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